This paper describes the study on the component and structure of the silicon oxide and silicon nitride films by infra-red absorbed spectrum. 利用红外吸收谱等微观分析对氧化硅和氨化硅薄膜的成分和结构进行了研究。
Depth crystalline evolution property for microcrystalline Si films deposited by ion-beam sputtering was studied. 研究了离子束溅射制备微晶硅薄膜的生长纵向结晶演化过程。
